Lithography vacuum and exhaust gas management for EUV high NA

The latest generation of EUV lithography has launched in the market; the higher numeric aperture and more powerful light source bring additional challenges for vacuum and exhaust gas management providers. From an environmental view, EUV owners expect the vacuum subsystem to perform a better carbon footprint than the last generation of the EUV system. This paper will discuss dealing with a higher flow rate of clean hydrogen gas and reducing utility usage simultaneously. The field running result and future improvement plan will be shared. Furthermore, some hydrogen can be reused through an exhaust management system, thus reducing hydrogen consumption by up to 80%.