材料科学
硅氧烷
摩擦学
粘附
摩擦系数
纳米尺度
硅
纳米技术
复合材料
化学物理
聚合物
冶金
物理
作者
Liang Peng,Chao-Chun Hsu,Chen Xiao,Daniel Bonn,Bart Weber
标识
DOI:10.1103/physrevlett.131.226201
摘要
Controlling macroscopic friction is crucial for numerous natural and industrial applications, ranging from forecasting earthquakes to miniaturizing semiconductor devices, but predicting and manipulating friction phenomena remains a challenge due to the unknown relationship between nanoscale and macroscopic friction. Here, we show experimentally that dry friction at multiasperity Si-on-Si interfaces is dominated by the formation of interfacial siloxane ($\mathrm{Si}─\mathrm{O}─\mathrm{Si}$) bonds, the density of which can be precisely regulated by exposing plasma-cleaned silicon surfaces to dry nitrogen. Our results show how the bond density can be used to quantitatively understand and control the macroscopic friction. Our findings establish a unique connection between the molecular scale at which adhesion occurs, and the friction coefficient that is the key macroscopic parameter for industrial and natural tribology challenges.
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