碳化硅
氮化镓
可靠性(半导体)
工程物理
碳化物
材料科学
氮化物
可靠性工程
功率半导体器件
镓
功率(物理)
宽禁带半导体
核工程
光电子学
纳米技术
工程类
物理
冶金
热力学
图层(电子)
作者
Tsuriel Avraham,Mahesh H. Dhyani,J.B. Bernstein
出处
期刊:Energies
[Multidisciplinary Digital Publishing Institute]
日期:2025-02-21
卷期号:18 (5): 1046-1046
摘要
Silicon Carbide (SiC) and Gallium Nitride (GaN) are revolutionizing power electronics with greater efficiency and durability than Silicon. Nevertheless, their widespread use is limited by reliability challenges, including thermal degradation, defect propagation, and charge trapping, affecting their stability and lifetime. This review explores these reliability issues, comparing empirical and physics-based models for predicting device performance and identifying practical limitations. We also examine strategies to enhance robustness, from material design improvements to advanced testing methods. We propose a demonstrative GaN power circuit topology specifically for demonstrating reliability in real-world conditions. This work highlights key challenges and opportunities in developing more reliable SiC and GaN technologies for future applications.
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