种植周围炎
锰
植入
材料科学
兴奋剂
氧化锰
氧化物
冶金
医学
外科
光电子学
作者
Eun-Hyuk Lee,Sangwoo Lee,Yongbeom Seo,Yu‐Heng Deng,Young‐Jun Lim,Ho‐Beom Kwon,Kyungpyo Park,Hyunjoon Kong,Myung‐Joo Kim
标识
DOI:10.1021/acsami.2c05166
摘要
Peri-implantitis is a major cause of dental implant failure. Bacterial biofilm contamination on the implant induces surrounding bone resorption and soft tissue inflammation, leading to severe deterioration of oral health. However, conventional biofilm removal procedures, such as mechanical decontamination and antiseptic application, are not effective enough to induce reosseointegration on decontaminated implant surfaces. This is due to (1) incomplete decontamination of the biofilm from inaccessible areas and (2) physicochemical alteration of implant surfaces caused by decontamination procedures. Herein, a safe and effective therapeutic approach for peri-implantitis is developed, which involves decontamination of implant-bound biofilms using the kinetic energy of microsized oxygen bubbles generated from the catalytic reaction between hydrogen peroxide (H
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