高功率脉冲磁控溅射
涂层
沉积(地质)
溅射沉积
腔磁控管
材料科学
物理气相沉积
溅射
光学涂层
工艺工程
工程物理
薄膜
光电子学
冶金
纳米技术
工程类
地质学
古生物学
沉积物
作者
Peter Kelly,R.D. Arnell
出处
期刊:Vacuum
[Elsevier BV]
日期:2000-03-01
卷期号:56 (3): 159-172
被引量:1814
标识
DOI:10.1016/s0042-207x(99)00189-x
摘要
Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings. Examples include hard, wear-resistant coatings, low friction coatings, corrosion resistant coatings, decorative coatings and coatings with specific optical, or electrical properties. Although the basic sputtering process has been known and used for many years, it is the development of the unbalanced magnetron and its incorporation into multi-source `closed-field’ systems that have been responsible for the rise in importance of this technique. Closed-field unbalanced magnetron sputtering (CFUBMS) is an exceptionally versatile technique for the deposition of high-quality, well-adhered films. The development, fundamental principles and applications of the CFUBMS process are, therefore, discussed in some detail in this review. Also discussed are other important recent developments in this area, including the pulsed magnetron sputtering process, variable field magnetrons, and the combining of sputtering techniques with other surface coating, or surface modification techniques in duplex production processes.
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