Research on aperture area measurement technique based on optical flux comparison method
光圈(计算机存储器)
光学
材料科学
干涉测量
焊剂(冶金)
遥感
作者
Zhiwei Liu,Wende Liu,Weiqiang Zhao,Yongjie Lin,Nan Xu,Yandong Lin
标识
DOI:10.1117/12.2601281
摘要
Accurate measurement of the aperture area has always been the focus of optics and optical radiation measurement. The metrology institutes around the world have established absolute aperture area measurement facilities. In this paper, a measuring system of the aperture area based on optical flux comparison method is designed and implemented., which can transfer absolute values efficiently and accurately. The results show that the deviation between the area measured by optical flux comparison method and the area measured by effective area method is about 5×10-4 . The influences of the light source stability, irradiation field uniformity and aperture positioning difference on the measurement results are analyzed emphatically. The uncertainty of the measurement results is also evaluated, the relative expanded uncertainty is 9.9×10- 4 (k=2).