Development of in situ characterization techniques in molecular beam epitaxy

分子束外延 表征(材料科学) 原位 材料科学 外延 纳米技术 光电子学 化学 有机化学 图层(电子)
作者
Shen Chao,Wenkang Zhan,M. Y. Li,Zhenyu Sun,Jian Tang,Zhaofeng Wu,Chi Xu,Bo Xu,Chao Zhao,Zhanguo Wang
出处
期刊:Journal of Semiconductors [IOP Publishing]
卷期号:45 (3): 031301-031301 被引量:7
标识
DOI:10.1088/1674-4926/45/3/031301
摘要

Abstract Ex situ characterization techniques in molecular beam epitaxy (MBE) have inherent limitations, such as being prone to sample contamination and unstable surfaces during sample transfer from the MBE chamber. In recent years, the need for improved accuracy and reliability in measurement has driven the increasing adoption of in situ characterization techniques. These techniques, such as reflection high-energy electron diffraction, scanning tunneling microscopy, and X-ray photoelectron spectroscopy, allow direct observation of film growth processes in real time without exposing the sample to air, hence offering insights into the growth mechanisms of epitaxial films with controlled properties. By combining multiple in situ characterization techniques with MBE, researchers can better understand film growth processes, realizing novel materials with customized properties and extensive applications. This review aims to overview the benefits and achievements of in situ characterization techniques in MBE and their applications for material science research. In addition, through further analysis of these techniques regarding their challenges and potential solutions, particularly highlighting the assistance of machine learning to correlate in situ characterization with other material information, we hope to provide a guideline for future efforts in the development of novel monitoring and control schemes for MBE growth processes with improved material properties.
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