纳米器件
材料科学
光电探测器
光电子学
制作
半导体
图层(电子)
原子层沉积
薄膜
光电阴极
范德瓦尔斯力
纳米技术
能量转换效率
化学
分子
物理
病理
电子
有机化学
替代医学
医学
量子力学
作者
Dhanasekaran Vikraman,Sajjad Hussain,Syed Hassan Abbas Jaffery,Hailiang Liu,K. Karuppasamy,Anandhavelu Sanmugam,Jongwan Jung,Hyun‐Seok Kim
出处
期刊:Solar RRL
[Wiley]
日期:2022-10-27
卷期号:6 (12)
被引量:7
标识
DOI:10.1002/solr.202200610
摘要
Atomically thick van der Waals (VdW)‐bonded layered transition metal dichalcogenide (TMD) structures have influenced the investigation of novel phenomena for modern electronics and energy devices immensely. Herein, the fabrication of atomically thick tunable mollybednum ditelluride thin films on substrates through a chemical bath methodology is shown for the first time. The proposed methodology can be used to fine tune the atomic layer thickness of MoTe 2 with highly modified surface characteristics, which is a greatly interesting feature for multifunctional nanodevice fabrication. Microscopic images confirm the atomic layer thickness‐tuned MoTe 2 . Furthermore, a photodetector assembled using few‐layer‐thick (S4) MoTe 2 shows a high photoresponsivity of 3.21 A W −1 under ultraviolet light and an excellent detectivity of 5.4 × 10 11 Jones, and a dye‐sensitized solar cell constructed using a photocathode made from S4 MoTe 2 atomic layers shows a high power conversion efficiency of 8.44%, which is much greater than that of many other layered TMD structures. In addition, synthesized S4 MoTe 2 atomic layers exhibit excellent hydrogen evolution characteristics in alkaline and acidic media. The resulting outcomes obviously establish the advantages of developed layered thick MoTe 2 to produce the outstanding interface characteristics between the vdW‐bonded atomic layers to achieve outstanding energy and semiconductor devices.
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