微尺度化学
润湿
接触角
磁滞
润湿转变
纳米技术
纳米尺度
材料科学
亚稳态
环境扫描电子显微镜
化学物理
蒸发
纹理(宇宙学)
扫描电子显微镜
复合材料
化学
凝聚态物理
热力学
物理
数学教育
数学
有机化学
图像(数学)
人工智能
计算机科学
作者
Michael Nosonovsky,Bharat Bhushan
出处
期刊:Langmuir
[American Chemical Society]
日期:2007-12-12
卷期号:24 (4): 1525-1533
被引量:197
摘要
Nonadhesive and water-repellent surfaces are required for many tribological applications. We study mechanisms of wetting of patterned superhydrophobic Si surfaces, including the transition between various wetting regimes during microdroplet evaporation in environmental scanning electron microscopy (ESEM) and for contact angle and contact angle hysteresis measurements. Wetting involves interactions at different scale levels: macroscale (water droplet size), microscale (surface texture size), and nanoscale (molecular size). We propose a generalized formulation of the Wenzel and Cassie equations that is consistent with the broad range of experimental data. We show that the contact angle hysteresis involves two different mechanisms and how the transition from the metastable partially wetted (Cassie) state to the homogeneously wetted (Wenzel) state depends upon droplet size and surface pattern parameters.
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