肖特基势垒
接触电阻
肖特基二极管
金属半导体结
光电子学
材料科学
半导体
晶体管
有机半导体
场效应晶体管
等效串联电阻
工作职能
电极
纳米技术
电压
化学
电气工程
图层(电子)
工程类
物理化学
二极管
作者
Qijing Wang,Sai Jiang,Bowen Zhang,Eul-Yong Shin,Yong-Young Noh,Yong Xu,Yi Shi,Xinyi Liu
标识
DOI:10.1021/acs.jpclett.9b03339
摘要
Despite the increasing understanding of charge transport in organic field-effect transistors (OFETs), charge injection from source/drain electrodes into organic semiconductors remains crucial for improving device performance and lowering power consumption. The analysis of contact resistance is generally carried out without clearly distinguishing the Schottky barrier and access resistance. Here we show that the access resistance through the organic semiconductor bulk can significantly influence the Schottky barrier evaluation and affect the charge-transport exploration. Indeed, access resistance plays a leading role in the contact resistance, whereas the Schottky barrier (expressed as the interface resistance) determines the charge injection at the metal/semiconductor interface. The Schottky barrier evaluation strongly depends on the access resistance and bias voltage. After eliminating the access resistance effect, the intrinsic Schottky barrier appears to be very coincident and weakly dependent on the work function of the contact metal. This work provides clues to understanding the Schottky barrier and charge injection in OFETs to optimize OFETs for high-performance and advanced applications.
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