纳米压痕
范德瓦尔斯力
材料科学
钨
异质结
纳米片
纳米技术
扫描电子显微镜
复合材料
化学
冶金
光电子学
分子
有机化学
作者
Yaohua Li,Yao-Yong Dong,Hui Dong,Xuejun Zheng,School of Mechanical Engineering, Xiangtan University, Xiangtan 411105, China
出处
期刊:Chinese Physics
[Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences]
日期:2022-01-01
卷期号:71 (19): 194601-194601
被引量:3
标识
DOI:10.7498/aps.71.20220875
摘要
Combining with <i>in situ</i> nanomechanical testing system and video module of scanning electron microscope, the nanoindentation testing is performed to study the peeling-tearing behavior of two-dimensional material van der Waals heterostructures. After two-dimensional MoS<sub>2</sub> nanosheets prepared by chemical vapor deposition are assembled into MoS<sub>2</sub>/SiO<sub>2</sub> heterostructures by wet transfer, the nanoindentation is carried out by manipulating the tungsten probe in the<i> in situ</i> nanomechanical testing system. When the tungsten probe is tightly indenting into MoS<sub>2</sub> nanosheets, a new W/MoS<sub>2</sub>/SiO<sub>2</sub> heterostructure is assembled. With the tungsten probe retracting, the adhesive effect makes the two-dimensional MoS<sub>2</sub> nanosheet peel off from SiO<sub>2</sub>/Si substrate to form a bulge. After reaching a certain height, under the van der Waals adhesion interaction, an incomplete penetration fracture occurs along the arc line contacting the needle. Then cleavage appears and produces two strip cracks and MoS<sub>2</sub>/SiO<sub>2</sub> interface separation takes place simultaneously, before a large area of MoS<sub>2</sub> nanosheet is teared. Based on the density functional theory calculation of interface binding energy density of van der Waals heterogeneous interface, the interface binding energy density of MoS<sub>2</sub>/W is verified to be larger than that of MoS<sub>2</sub>/SiO<sub>2</sub>, which explains the adhesion peeling behavior of MoS<sub>2</sub> induced by van der Waals force between heterogeneous interfaces, perfectly. By using the peeling height and tearing length of MoS<sub>2</sub> recorded by video module, the fracture strength of MoS<sub>2</sub> is obtained to be 27.055 GPa and stress-strain relation can be achieved according to the film tearing model. The density functional theory simulation results show that the fracture strength of MoS<sub>2</sub> is in a range of 21.7–32.5 GPa, and the stress-strain relation is consistent with the experimental result measured based on film tearing model. The present work is expected to play an important role in measuring the fracture strengths of two-dimensional materials, the assembly, disassembly manipulation and reliability design of two-dimensional materials and van der Waals heterostructures devices.
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