碲化镉光电
材料科学
腐蚀坑密度
超晶格
位错
光电子学
薄脆饼
缓冲器(光纤)
外延
Crystal(编程语言)
图层(电子)
结晶学
纳米技术
化学
蚀刻(微加工)
复合材料
电信
计算机科学
程序设计语言
作者
Wenwu Pan,Shuo Ma,Xiao Sun,Shimul Kanti Nath,Songqing Zhang,Renjie Gu,Zekai Zhang,L. Faraone,Wen Lei
摘要
The ever-present demand for high-performance HgCdTe infrared detectors with larger array size and lower cost than currently available technologies based on lattice-matched CdZnTe (211)B substrates has fuelled research into heteroepitaxial growth of HgCdTe and CdTe buffer layers on lattice-mismatched alternative substrates with a (211)B orientation. Driven by the large lattice mismatch, the heteroepitaxial growth of (Hg)CdTe can result in (133)B-orientated material, which, however, has been less explored in comparison to (211)B-oriented growth. Herein, we report on the structural properties of heteroepitaxially grown single-crystal II–VI CdTe (133)B-oriented buffer layers on III–V GaAs (211)B substrates. Azimuthal-dependent x-ray double-crystal rocking curve measurements for the CdTe buffer layers show that the full-width at half-maximum value obtained along the GaAs [1¯11] direction is narrower than that obtained along the GaAs [011¯] direction, which is presumably related to the in-plane anisotropic structural characteristics of the grown CdTe layers. By incorporating strained CdZnTe/CdTe superlattice-based dislocation filtering layers (DFLs), a significant improvement in material quality has been achieved in (133)B-orientated CdTe buffer layers, including a reduced etch pit density in the low-105 cm−2 range and improved surface roughness. These results indicate that the CdTe (133)B DFL buffer layer process is a feasible approach for growing high-quality CdTe and HgCdTe materials on large-area, low-cost alternative substrates.
科研通智能强力驱动
Strongly Powered by AbleSci AI