抛光
泥浆
材料科学
合金
铝
化学机械平面化
表面粗糙度
冶金
表面光洁度
曲面(拓扑)
复合材料
几何学
数学
作者
Xiaofei Lei,Zhenyu Zhang,Hongxiu Zhou,Leilei Chen,Xingqiao Deng,Weiting Liu,Xuye Zhuang,Mengyi Wang,Yang Gu
出处
期刊:Nanoscale
[Royal Society of Chemistry]
日期:2025-01-01
卷期号:17 (20): 12684-12694
被引量:3
摘要
A novel near-neutral green CMP slurry was developed, achieving a close atomic surface on aluminum alloy. The surface roughness (Sa) was 0.231 nm, and the material removal rate was 12.56 μm h −1 .
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