材料科学
辐照
光电子学
辐射硬化
通量
辐射
电子
氮化镓
纳米尺度
二极管
掺杂剂
电子束处理
纳米技术
兴奋剂
物理
光学
核物理学
图层(电子)
作者
Keshab Sapkota,György Vizkelethy,George R. Burns,George T. Wang
标识
DOI:10.1109/ted.2023.3330458
摘要
Gallium nitride (GaN)-based nanoscale vacuum electron devices, which offer advantages of both traditional vacuum tube operation and modern solid-state technology, are attractive for radiation-hard applications due to the inherent radiation hardness of vacuum electron devices and the high radiation tolerance of GaN. Here, we investigate the radiation hardness of top-down fabricated n-GaN nanoscale vacuum electron diodes (NVEDs) irradiated with 2.5-MeV protons (p) at various doses. We observe a slight decrease in forward current and a slight increase in reverse leakage current as a function of cumulative protons fluence due to a dopant compensation effect. The NVEDs overall show excellent radiation hardness with no major change in electrical characteristics up to a cumulative fluence of 5E14 p/cm<sup>2</sup>, which is significantly higher than the existing state-of-the-art radiation-hardened devices to our knowledge. In conclusion, the results show promise for a new class of GaN-based nanoscale vacuum electron devices for use in harsh radiation environments and space applications.
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