<title>Automatic Mask And Reticle Inspection System</title>

Automatic photomask inspection systems have been commercially available for a number of years. KLA Instruments has manufactured systems which utilize die-comparison to detect photomask defects. This paper describes some of the technical modifications and enhancements which augment the basic photomask inspection capability of a die-comparison system by adding the capability to inspect a single-die reticle against the data base which generated it.