肖特基二极管
电气工程
二极管
材料科学
拓扑(电路)
光电子学
工程类
作者
Shen-Li Chen,Shi-Zhe Hong,Wei‐Jung Chen
标识
DOI:10.23919/ipec-himeji2022-ecce53331.2022.9806937
摘要
In this paper, a TSMC 0.18-μm 70-V process is used to realize the high-voltage pLDMOS device to modulate the parasitic Schottky/SCR elements to evaluate its influence on the discharge current capability. According to the TLP measurement results, the corresponding trigger voltage (V t1 ), holding voltage (V h ) and secondary breakdown current (I t2 ) values can be obtained. In the parasitic Schottky/SCR modulations at the drain side, it can be found that the parasitic Schottky structure at the drain terminal can increase the on-resistance of the device, and the parasitic SCR device at the drain terminal will have lower V t1 and V h , but it will have excellent I t2 . If the drain terminal is parasitic vertical SCR and Schottky device structures at the same time, it will have quite good latch-up immunity and better ESD current discharge capability. Nevertheless, if only the latch-up issue is considered, it is best to change the entire drain end to the parasitic Schottky element, and the ESD capability is also slightly improved.
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