螺旋钻
X射线光电子能谱
铜
金属
分析化学(期刊)
氧气
氧化物
动力学
材料科学
俄歇电子能谱
化学工程
化学
原子物理学
有机化学
核物理学
工程类
物理
量子力学
色谱法
作者
Robert Peter,M. Petravić
标识
DOI:10.1021/acs.jpcc.1c07615
摘要
We have studied the oxidation kinetics of initial stages of oxide formation on clean metallic copper surfaces during low-energy O2+ bombardment at room temperature using X-ray photoelectron spectroscopy around Cu 2p and O 1s core-levels and Auger Cu LMM peaks. Two stages in the oxidation process of Cu were observed. For the lower oxygen doses, a single, Cu2O, phase was formed, while the growth of the second, CuO, phase preferentially forms at higher doses. The relative contributions of Cu2O and CuO phases were determined from the deconvolution of Auger Cu LMM spectra, while the thickness of the oxides was estimated from the intensity of the underlying metallic Cu LMM signal and in-depth profiles obtained by secondary ion mass spectrometry. While the growth of the Cu2O layer follows the linear oxidation kinetics, characteristic of the fast chemical reactions of oxygen with the host atoms around the penetration depth of impinging oxygen atoms, the logarithmic law was found for the CuO growth, consistent with the formation of CuO nuclei within the Cu2O matrix.
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