超纯水
硫酸
半导体器件制造
半导体工业
环境科学
工艺工程
化学工业
能源消耗
持续性
过程(计算)
资源(消歧)
用水
废物管理
薄脆饼
工程类
环境工程
计算机科学
制造工程
材料科学
纳米技术
电气工程
冶金
操作系统
生物
计算机网络
生态学
作者
Jim Snow,Charles Miller,Ryosuke Tanaka,Jun Shibukawa,Nukui Hiroki,Yamamoto Tetsuya,Masayuki Hayashi,Shibayama Nobuyuki,Endo Toru
摘要
The semiconductor industry is a significant consumer of water and chemicals. In particular, water is a valuable resource, and its efficient use is crucial to ensure availability for future generations. By implementing measures to reduce water and chemical consumption, the semiconductor industry can minimize its environmental footprint and contribute to sustainability efforts. Technology for the recycling of unused hot ultrapure water (H-UPW), ozonated water and reclaimed sulfuric acid-hydrogen peroxide mixtures (SPM) has been developed and installed in high-volume manufacturing (HVM) semiconductor manufacturing facilities. This paper presents an overview of the technology and expected savings in water, sulfuric acid and energy consumption from the implementation of these technologies.
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