Direct patterning of functional materials using nanoimprint lithography

Nanoimprint lithography is a large area, high resolution and cost-effective replication technology for micro- and nanostructures. An interesting possibility in the nanoimprint process is the use of materials that remain a functional part of the final component or device. Such an additive approach offers interesting opportunities in terms of novel applications but also cost reduction and could also contribute to sustainability aspects. This paper is aiming at providing a short noncomprehensive overview on the direct patterning of various functional materials by using NIL for optics and life science applications.