带隙
材料科学
MOSFET
碳纳米管
热离子发射
光电子学
量子隧道
泄漏(经济)
纳米技术
晶体管
物理
电子
量子力学
宏观经济学
经济
电压
作者
Qing Lin,Gregory Pitner,Carlo Gilardi,Sheng‐Kai Su,Zichen Zhang,Edward Chen,Prabhakar R. Bandaru,Andrew C. Kummel,Han Wang,M. Passlack,Subhasish Mitra,H.‐S. Philip Wong
标识
DOI:10.1109/led.2022.3141692
摘要
Carbon nanotube (CNT) transistors exemplify the fundamental tradeoff between desirable high mobility and undesirable leakage current due to the small effective mass and bandgap. To understand leakage current limits in high-speed CNT transistors, electrical bandgaps are extracted on 12 single-CNT top-gate MOSFETs from the energy gap between thermionic emission and band-to-band tunneling (BTBT) at 10 K. At 300 K the minimum IOFF at 0.5 V VDS is analyzed as a function of bandgap between 0.96 eV and 0.43 eV with IOFF-MINfrom 0.2 pA/CNT to 15 nA/CNT. NEGF simulation validates the bandgap extraction methodology and reproduces the experimental MOSFET IOFF-MIN data. A TCAD model calibrated to this work’s leakage data projects the accessible ION-IOFF design space bounded by CNT bandgap, indicating EG > 0.65 eV (dCNT < 1.3 nm) is needed to achieve 100 nA/ $\mu \text{m}$ at 0.5 V VDD and 250 CNT/ $\mu \text{m}$ for channel length above 20 nm. An EG of 1.06 eV (dCNT = 0.8 nm) can deliver $2750\times $ tunable range of IOFF by adjusting VT, which exceeds the $400\times $ tunable range of IOFF used in Si CMOS platform technologies.
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