Growth, composition and structure of plasma-deposited siloxane and silazane

R.f. diode plasmas have been used for polymeric film deposition from hexamethyldisiloxane and hexamethyldisilazane monomers. The effect of monomer pressure, r.f. power and substrate temperature on the growth rate of the films has been analysed. The effect of substrate temperature on the structures and compositions of the films has been investigated using X-ray photoelectron spectroscopy and Fourier transform IR analysis.