渗氮
等离子体
材料科学
溅射
图层(电子)
热力学平衡
辉光放电
相平衡
热力学
冶金
相(物质)
复合材料
纳米技术
化学
薄膜
物理
有机化学
量子力学
标识
DOI:10.1179/sur.1985.1.4.283
摘要
Equilibrium and non-equilibrium models of γ'-Fe 4 N growth during nitriding are considered in an attempt to explain the differences observed in the growth of this phase during glow discharge plasma nitriding and gas nitriding. Calculated results taking account of cathode sputtering agree well with experimentally observed ones. Solutions for the non-equilibrium model approach those of the equilibrium model when mobility of the γ'/α interface approaches infinity.
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