Ion source development at GSI

Different ion sources are used at GSI to match the requirements for specific tasks at the accelerator. At the standard injector a Penning ionization gauge ion source is used (design ion U10+, m/q<24, 1 emA). Further development of this source is mainly aiming at an increase of the extractable currents and an increase of the lifetime of the source. The new injector produces the beam by means of an electron cyclotron resonance source (Caprice-type). Here the design ion is U28+, m/q<8.5, 5 eμA. Clearly, the oven technology is our main development goal. In addition we are trying to improve the extraction flexibility by a moveable accel–decel system. For our high current project ion sources are required which are capable to deliver a beam of several mA even for heavy ions. Design ion here is U4+, m/q<65, 15 emA. For that application two different types of ion source are used: the multicusp ion sources “cold or hot reflex discharge ion source” and “multicusp ion source” for gaseous ions and the MEVVA source for metal beams.