化学
铜
催化作用
氟
乙烯
氢氟酸
法拉第效率
氢
拉曼光谱
光谱学
密度泛函理论
核磁共振波谱
无机化学
卤素
乙二醇
氧气
化学工程
接触角
纳米技术
选择性
多相催化
离子
金属
光化学
同位素标记
路易斯酸
化学稳定性
碳酸乙烯酯
魔角纺纱
作者
Geetansh Chawla,Nilutpal Dutta,Siddhi Kediya,Debabrata Bagchi,Anu Pulparambil,Andrew G. M. Rankin,Sayan Das,Subhajit Chakraborty,G. N. Manjunatha Reddy,Sebastian C. Peter
摘要
Oxide-derived (OD) Cu catalysts are recognized for their effectiveness in producing C2+ products, but often revert to their metallic state, reducing selectivity due to the loss of their positive oxidation state. Here, we report a novel strategy to incorporate fluorine (F) into Cu2O nanospheres using hydrofluoric acid (HF). While halogen acids have traditionally been employed to etch metals and create cavities for confinement effects, this work goes a step further by inserting F ions into the lattice. Among all halogens, F provided the best lattice stability and was thus selected for catalyst testing. F incorporation was found to stabilize the Cu (δ+) oxidation state, achieving an impressive Faradaic efficiency (FE) of 91.9 ± 2.03% for C2+ products, predominantly ethylene (67%), at a current density of 250 mA cm-2. High-field 1D and 2D 19F magic-angle spinning (MAS) solid-state nuclear magnetic resonance (ssNMR) spectroscopy provided definitive evidence of F substitution at oxygen vacancies and the formation of a surface layer of HF. Water contact angle (WCA) measurements revealed enhanced hydrophobicity, with the 3 M HF-treated Cu2O exhibiting superhydrophobicity (WCA = 161°), which effectively suppressed hydrogen evolution (HER). In situ Raman spectroscopy confirmed prolonged stability of the Cu2O phase in the F-incorporated catalyst, while in situ ATR-FTIR spectroscopy with isotopic labeling elucidated the mechanistic pathway for ethylene production. Additionally, density functional theory (DFT) calculations offered mechanistic insights into ethylene formation, while Bader charge analysis revealed the electronic role of F incorporation in Cu2O, thereby providing insight into its enhanced selectivity.
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