Effect of magnetic field on the thickness uniformity of thin film deposited on inner surface

In order to improve the thickness uniformity of thin film deposited on inner surface, an auxiliary magnetic field was set inside the arc ion plating device and applied during thin film deposition. Effect of magnetic field on the film thickness uniformity was studied through simulation and experiments. Simulation results revealed that magnetic field significantly increased the amount of ions deposited in the pipe. Along the axis of the pipe, the number of deposited ions first decreased and then increased. Experiment results proved that magnetic field changed the trend of the film thickness along the axis of the pipe and raised the ratio of the minimum to the maximum of the film thickness, thereby improving the film thickness uniformity. When magnetic field was applied together with bias, both the film thickness and thickness uniformity increased with the magnetic field intensity.