Analysis of abnormal threshold voltage shift induced by surface donor state in GaN HEMT on SiC substrate

This study investigates the recovery behavior of GaN high-electron mobility transistors on SiC substrates under different hot-carrier stress conditions. The threshold voltage shifts positively due to hot electron trapping at the buffer layer under hot-carrier stress. However, the recovery between semi-on (Vt < VG < 0 V) hot-carrier stress and on-state (VG > 0 V) carrier stress is significantly different. This phenomenon is systematically discussed in terms of the applied gate voltage under stress condition, which affects the occupation of the surface donor states. After applying a semi-on hot-carrier stress, the threshold voltage continues to shift positively after relaxing the applied voltage. In contrast, the threshold voltage exponentially recovers after applying an on-state hot-carrier stress. Silvaco technology computer aided design (TCAD) simulation was performed to verify the effect of the surface donor state on the threshold voltages. Since switching between on-state and off-state in RF-applications includes both conditions, we suggest that the surface donor states are crucial to determine the failure of devices.