响应度
光电子学
光电探测器
材料科学
光电导性
宽带
热辐射计
薄脆饼
比探测率
制作
溅射沉积
溅射
探测器
光学
薄膜
纳米技术
物理
医学
替代医学
病理
作者
B Zhang,Yunjie Liu,Bing Hu,Fuhai Guo,Mingcong Zhang,Siqi Li,Weizhuo Yu,Lanzhong Hao
出处
期刊:2D materials
[IOP Publishing]
日期:2024-02-22
卷期号:11 (2): 025024-025024
被引量:1
标识
DOI:10.1088/2053-1583/ad2c11
摘要
Abstract Due to its large absorption coefficient and high carrier mobility, SnS exhibits strong promise in the area of optoelectronic devices. Nevertheless, the fabrication of large-area, high-quality films for SnS photodetectors (PDs) with superior photoresponse remains a formidable task, seriously limiting its further practical application. In the present study, we report a superior-performance broadband PD founded on the epitaxial SnS film. Large-area uniform SnS films were grown epitaxially on (100)-oriented KBr using magnetron sputtering technique, further exfoliated, and transferred in a wafer size to fabricated two-ends PD devices. Benefitting from high crystallization and unique photoconductive-bolometric coupling effect, the two modes of operation exhibit a wide range of spectral responses from the visible to near-infrared wavelength (405–1920 nm). Particularly noteworthy is the SnS device fabricated, which demonstrates an impressive responsivity of 95.5 A W −1 and a detectivity of 7.8 × 10 11 Jones, outperforming other devices by 1–2 orders of magnitude. In addition, SnS PD shows excellent environmental durability. This work provides a robust approach to develop high-performance broadband SnS PDs, while simultaneously offering deep insight into the light–matter interactions.
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