Mechanical stength of Czochralski silicon crystals with carbon concentrations from 1014 to 1016 cm−3
作者
Tetsuo Fukuda
出处
期刊:Applied Physics Letters [American Institute of Physics] 日期:1994-09-12卷期号:65 (11): 1376-1378被引量:10
标识
DOI:10.1063/1.112057
摘要
Using Czochralski-grown silicon crystals with carbon concentrations from 1014 to 1016 cm−3, we studied the influence of oxygen precipitates on the mechanical strength of silicon crystals. Reducing carbon concentration from 1016 to 1014 cm−3 suppressed oxygen precipitation and thus, improved the strength. Carbon concentration reduction from 1015 to 1014 cm−3 did not, however, decrease oxygen precipitation as dramatically as reduction from 1016 to 1015 cm−3. Carbon impurities below 1014 cm−3 no longer affect oxygen precipitation. Therefore, we conclude that reducing carbon concentration below 1014 cm−3 no longer improves the mechanical strength of silicon crystals.