材料科学
绝缘体上的硅
耦合损耗
光学
波导管
宽带
光电子学
光子集成电路
联轴节(管道)
光子学
硅
硅光子学
光纤
物理
冶金
作者
Purnima Sethi,Shankar Kumar Selvaraja
出处
期刊:Applied Optics
[Optica Publishing Group]
日期:2019-08-02
卷期号:58 (23): 6222-6222
被引量:2
摘要
We experimentally demonstrate a broadband, fabrication-tolerant compact silicon waveguide taper (34.2 μm) in a silicon-on-insulator wire waveguide. The taper works on multimode interference along the length of the taper. A single taper design has broadband operation with coupling efficiency >70% over 700 nm that can be used in O-, C-, and L-bands. The compact taper is highly tolerant to fabrication variations; ±100 nm change in the taper and end waveguide width varies the taper transmission by <5%. The footprint of the device, i.e., the taper along with linear gratings, is ≈442 μm2, 11.5× smaller than the adiabatic taper. The taper with linear gratings provides coupling efficiency comparable to standard focusing gratings. We have also experimentally compared the translational and rotational alignment tolerance of the focusing grating with linear grating couplers.
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