微观结构
材料科学
退火(玻璃)
透射电子显微镜
等温过程
合金
大气温度范围
亚稳态
电子能量损失谱
光谱学
放松(心理学)
铜
分析化学(期刊)
结晶学
复合材料
冶金
热力学
化学
纳米技术
有机化学
社会心理学
色谱法
物理
心理学
量子力学
作者
J. P. Ngantcha,M. Gerland,Y. Kihn,Alain Rivière
出处
期刊:European Physical Journal-applied Physics
[EDP Sciences]
日期:2004-11-23
卷期号:29 (1): 83-89
被引量:35
标识
DOI:10.1051/epjap:2004200
摘要
Internal oxidized copper was tested by isothermal mechanical spectroscopy in a medium temperature range (300–600 K). Experimental results show the existence of a non-thermally activated effect at low temperature and of a relaxation peak at higher temperatures. The material microstructure was studied by combination of Transmission Electron Microscopy (TEM) and Electron Energy Loss Spectrometry (EELS). The TEM study allowed us to investigate the distribution of fine spherical particles and the presence of particular network dislocations inside the grains. The EELS method was used to identify the nature of these fine particles as Cu2O. The internal friction has revealed a non thermally activated maximum occurring at 0.1 Hz for temperatures ranging from 290 K to 394 K, and a relaxation peak obtained after annealing at 573 K. This peak is stable after successive annealings at 723 K and 873 K. Comparison of the microstructure observations, their evolution with annealing and the evolution of the relaxation effect with annealing temperature enables us to interpret the phenomena described in this work: on the one hand, the microstructural characterisation using TEM and EELS allows us to assign the first effect to the result of a transformation of metastable Cu2O particles to CuO under the cyclic stress; on the other hand, the relaxation peak that does not change after high temperature annealing is linked with a particular stable dislocation network observed in many grains.
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