光致发光
材料科学
外延
带隙
硅
光电子学
宽禁带半导体
直接和间接带隙
合金
薄膜
纳米技术
冶金
图层(电子)
作者
Seyed Amir Ghetmiri,Wei Du,Joe Margetis,Aboozar Mosleh,Larry Cousar,Benjamin R. Conley,Lucas Domulevicz,Amjad Nazzal,Greg Sun,Richard Soref,John Tolle,Baohua Li,Hameed A. Naseem,Shui-Qing Yu
摘要
Material and optical characterizations have been conducted for epitaxially grown Ge1−xSnx thin films on Si with Sn composition up to 10%. A direct bandgap Ge0.9Sn0.1 alloy has been identified by temperature-dependent photoluminescence (PL) study based on the single peak spectrum and the narrow line-width. Room temperature PL emission as long as 2230 nm has also been observed from the same sample.
科研通智能强力驱动
Strongly Powered by AbleSci AI