兴奋剂
光致发光
材料科学
杂质
钙钛矿(结构)
掺杂剂
SN2反应
替代(逻辑)
晶体缺陷
光电子学
凝聚态物理
分析化学(期刊)
物理
立体化学
结晶学
化学
量子力学
色谱法
计算机科学
程序设计语言
作者
Zhifang Tan,Jinghui Li,Cheng Zhang,Zha Li,Qingsong Hu,Zewen Xiao,Toshio Kamiya,Hideo Hosono,Guangda Niu,Efrat Lifshitz,Yi‐Bing Cheng,Jiang Tang
标识
DOI:10.1002/adfm.202004738
摘要
Adv. Funct. Mater. 2018, 28, 1801131 In the initially published version of this article, the calculated formation enthalpies of the Bi-related impurities in Figure 5b and Figure S8 are incorrect. The errors were introduced when determining the chemical potentials of Bi dopant. The corrected Figure 5 and Figure S8 are given below. The text on page 5 “BiSn also can hardly form under the Sn4+-rich/Sn2+-poor conditions (i.e., in the high μSn regions C–F in the yellow region in Figure 5a) due to the too high ΔH values; but it can form under Sn4+-poor/Sn2+-rich conditions (in the low μSn regions A, B, and G), where the ΔH values are low and even negative.” should be revised as “BiSn also can hardly form under the Sn4+-rich/Sn2+-poor conditions (i.e., in the high ΔμSn region near points C–F in the yellow region in Figure 5a) due to the too high ΔH values; but it can form under Sn4+-poor/Sn2+-rich conditions (in the low ΔμSn region near point A), where the ΔH values are as low as 0.18 eV.” The text on page 6 “For example, as discussed in Figure 5b, simultaneous formation of VCl along with BiSn (i.e., defect complex) has almost the same ΔH as a simple substitution BiSn.” should be revised as “As shown in Figure 5b, simultaneous formation of VCl along with BiSn (i.e., defect complex) has lower ΔH than the simple substitution BiSn.” None of the conclusions of the main text are affected by this correction. The authors apologize for any inconvenience or misunderstanding that the errors may have caused.
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