XAFS Studies of Amorphous Silicon Nitride

The structure of chemical vapor-deposited (CVD) amorphous silicon nitride (a-Si 3 N 4 ) has been studied at the Si K-edge by the use of a laboratory XAFS system. The average bond lengths and coordination numbers of the nearest-neighbors Si-N and Si-Si have been determined from the obtained EXAFS data. We discussed the local structure of the a-Si 3 N 4 .