Molecular Approach to Surface Control of Chalcogenide Semiconductors

The interaction between a chalcogenide semiconductor surface and a specific chelating ligand was studied by a number of complementary spectroscopic methods (UV/VIS, FTIR, XPS). FTIR suggests that the chelating ligand (diphenyl hydroxamic acid) complexes an In 3+ ion in CuInSe 2 , and a Cd 2+ ion in CdTe, accompanied by the loss of a proton. Contact potential measurements showed that the adsorbed ligand changes the semiconductor electron affinity without significantly influencing the band bending. On the basis of these and other results, we suggest that the molecular dipole of the chelating ligand is responsible for the change in surface potential. Because this dipole can be modified without changing the ligand's binding group, this finding opens the way to control surface potential by varying the dipole moment of the adsorbed ligand without changing the binding functional group.