Molecular-orbital model for metal-sapphire interfacial strength
作者
K. H. Johnson,Stephen V. Pepper
出处
期刊:Journal of Applied Physics [American Institute of Physics] 日期:1982-10-01卷期号:53 (10): 6634-6637被引量:197
标识
DOI:10.1063/1.330095
摘要
Self-consistent-field X-Alpha scattered-wave cluster molecular-orbital models have been constructed for transition and noble metals (Fe, Ni, Cu, and Ag) in contact with a sapphire (Al2O3) surface. It is found that a chemical bond is established between the metal d-orbital electrons and the nonbonding 2p-orbital electrons of the oxygen anions on the Al2O3 surface. An increasing number of occupied metal-sapphire antibonding molecular orbitals explains qualitatively the observed decrease of contact shear strength through the series Fe, Ni, Cu, and Ag.