X-ray Lithography with Environmentally Stable Chemical Amplification Positive Resist

Synchrotron x-ray lithography of a new environmentally stable chemically amplified positive resist (ESCAP) is described. The resist consists of a thermally and hydrolytically stable resin and acid generator and employs high temperature bake processes to achieve resistance to airborne contamination. The resist is environmentally stable due to reduction of the free volume by annealing and affords true single layer x-ray lithography, eliminating a need for a protective overcoat. Its design concept and x-ray lithographic performance are discussed.