材料科学
异质结
电介质
耗散因子
退火(玻璃)
介电谱
电容
光电子学
介电损耗
凝聚态物理
热传导
电阻抗
分析化学(期刊)
恒相元件
载流子
高-κ电介质
介电常数
等效串联电阻
溅射沉积
电导率
耗尽区
偶极子
电阻率和电导率
腔磁控管
放松(心理学)
时间常数
硅
极化(电化学)
电子迁移率
薄膜
作者
Kusuma Jagadish,Dhananjaya Kekuda
标识
DOI:10.1088/2053-1591/ae07a6
摘要
Abstract This study investigates the AC electrical properties of Cu 2 O/TiO 2 heterojunctions deposited via reactive DC magnetron sputtering, with a focus on the role of interfacial dynamics and post-deposition annealing. Mott–Schottky analysis revealed built-in potentials ranging from 0.45 V to 1.92 V, with carrier concentrations between 1.43 × 10 16 and 9.93 × 10 16 cm −3 , influenced by the annealing temperature. The depletion width was estimated to be roughly 395 nm in the 150 °C annealed samples, and the TiO 2 layer was more depleted across all samples. Dielectric constant ( ε ′) values decreased from approximately 85 to about 10 as frequency increased from 1 kHz to 1 MHz, while tangent loss also diminished significantly, indicating reduced dipolar and space-charge polarization. The imaginary part of the dielectric constant ( ε ″) confirmed strong interfacial polarization at low frequencies. AC conductivity rose with frequency, supporting a thermally activated hopping conduction mechanism. Impedance spectroscopy, modelled with an R(CR)(QR)(CR) circuit, exhibited multiple relaxation behaviors, and incorporating a constant phase element (CPE) accounted for non-ideal dielectric effects caused by surface inhomogeneity. Rapid thermal annealing resulted in a decrease in series resistance, from 844 Ω at room temperature to 802 Ω at 150 °C. Annealing at 150 °C produced optimal outcomes, reducing interface losses and enhancing charge transport. These findings underscore the tunability and potential of Cu 2 O/TiO 2 heterostructures for optoelectronic applications such as photodetectors and solar cells.
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