材料科学
薄脆饼
铜
硅
扩散阻挡层
太阳能电池
镀铜
图层(电子)
光电子学
电镀(地质)
丝网印刷
氮化硅
共发射极
基质(水族馆)
同质结
冶金
纳米技术
复合材料
兴奋剂
电镀
地质学
海洋学
地球物理学
作者
Jef Poortmans,E. Van Kerschaver,Tom Janssens,Victor Prajapati,Harold Philipsen,V. Lazov,José Luis Hernández,Niels Posthuma
标识
DOI:10.4229/24theupvsec2009-2bo.1.5
摘要
As an alternative method to printing techniques, the metal contacts of silicon solar cells can be realized by plating. Copper is an interesting choice of metal, especially taking into account its high conductivity and low price. However, barrier layers are needed to prevent copper diffusion into the silicon. In this paper we use TXRF, QSSPC and CDI to evaluate the potential diffusion of copper through the silicon nitride anti reflection coating after exposing the wafers to Cu plating solutions. Three plating solutions with varying purity are investigated. Furthermore first PERC solar cells have been realized with copper plated contacts having a Ti/Cu contact layer with a best large area cell efficiency of 18.3%.
科研通智能强力驱动
Strongly Powered by AbleSci AI