Industrial Perspective of SiC Epitaxy

As the title states, this book chapter attempts to provide an industrial perspective of SiC epitaxy. As elaborated below, this a challenging endeavor as the field is still rapidly evolving with very competition-sensitive developments for increasing SiC layer quality, uniformity, and throughput. The current state of the art in epitaxy has been enabled by many years of research, development, and applied engineering experience. Of course, these areas can only be touched upon here given the finite size of a book chapter. Fortunately, the provided references and companion chapter on some of the more theoretical aspects of SiC epitaxy written by Dr. Birgit Kallinger of Fraunhofer University provide an excellent launching point for the reader.