溅射
俄歇电子能谱
分析化学(期刊)
表面光洁度
表面粗糙度
化学
材料科学
光谱学
螺旋钻
薄膜
冶金
原子物理学
复合材料
纳米技术
物理
色谱法
量子力学
核物理学
作者
Songyou Lian,Hao Yang,Janez Kovač,J.J. Terblans,Jiangyong Wang,H.C. Swart,Congkang Xu
标识
DOI:10.1016/j.tsf.2022.139202
摘要
The measured Auger electron spectroscopy (AES) depth profiles of the as-deposited Ag/Ni multilayers demonstrate a strong preferential sputtering effect. In the framework of the Mixing-Roughness-Information depth (MRI) model, the influence of preferential sputtering on the “measured” depth profile is quantitatively evaluated. The mass conservation upon AES preferential sputtering is verified and applied to obtain the true layer thickness from the measured depth profiling data (i.e. intensity or composition as a function of sputtering time). Meanwhile the influences of preferential sputtering and non-stationary roughness effects on the depth resolution are also quantitatively evaluated. Based on the developed model, the measured AES depth profiles of the Ag/Ni multilayers as-deposited and annealed at different temperatures are fitted and the interdiffusion coefficients are obtained accordingly.
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