作者
Han Wu,Xiaoling Cai,Wenjia Yang,Bo Feng,YANBING LI,Ming Liu,Nanwei Tong,Linong Ji
摘要
Introduction and Objective: The global prevalence of type 2 diabetes mellitus (T2DM) is widely recognized to be on the rise. It is of great significance to reveal the current status of antidiabetic therapy in patients with T2DM. Methods: “Real-world Multicenter Registry to Determine Management and Quality of Care of Patients With Type 2 Diabetes in China” (iCaReMe China) is a prospective, multicentric, observational registry study. The study enrolled a total of 9,000 adults with T2DM from 60 hospitals in China from 2023 July to 2024 March, collecting demographic information, treatment patterns, complications, physical examination and laboratory test results. Results: Of the 9,000 participants enrolled, 99.2% were treated with antidiabetic medication, among which, 28.5% of the patients received monotherapy, and 71.5% of them received combination therapy. Metformin was the most frequent antidiabetic medication (59.5%), followed by SGLT2 inhibitor (38.9%), insulin (36.8%), α-glycosidase inhibitor (29.2%), DPP-4 inhibitor (16.8%), GLP-1 receptor agonist (14.9%), sulphonylurea (9.4%), and thiazolidinedione (5.2%). Compared with patients without diabetic complications, higher user percentage of SGLT2 inhibitor (46.9% vs 37.3%, P<0.001; 42.7% vs 38.4%, P=0.002), GLP-1 receptor agonist (20% vs 14%, P<0.001; 17.4% vs 14.4%, P=0.003), insulin (53.9% vs 33.8%, P<0.001; 46.2% vs 34.9%, P<0.001), α-glycosidase inhibitor, DPP-4 inhibitor and sulphonylurea were observed respectively in patients with microvascular and macrovascular diabetic complications. Conclusion: iCaReMe China demonstrated descriptive data on antidiabetic medication treatment patterns in Chinese patients with T2DM. Metformin is the most commonly used antidiabetic medication in Chinese patients with T2DM. The patients with microvascular and macrovascular diabetic complications were more likely to use SGLT2 inhibitors and GLP-1 receptor agonists. Disclosure H. Wu: None. X. Cai: None. W. Yang: None. B. Feng: None. Y. Li: None. M. Liu: None. N. Tong: None. L. Ji: None.