Revealing Mechanisms of an Eco-Friendly GaN Electrochemical Mechanical Removal Process Modified with Green Fenton Reaction

< 0.33 nm) can be realized by employing STPP as electrolyte additives. This study breaks the limitation of iron precipitate formation in the ECMP slurries during the Fenton reaction. It extends the lifetime of the hydroxyl radicals (OH*) produced by the Fenton reaction, which presents a beneficial exploration of seeking an eco-friendly polishing slurry for GaN-ECMP.