高电子迁移率晶体管
氮化镓
晶体管
电压
材料科学
电气工程
光电子学
电子工程
工程类
纳米技术
图层(电子)
作者
Hun-Gyu Chae,Dong-Hee Kim,Minjung Kim,Byoung‐Kuk Lee
标识
DOI:10.5370/kiee.2016.65.10.1664
摘要
This paper presents the analysis of the gate-source voltage of the gallium nitride high electronic mobility transistor (GaN HEMT) in the half bridge structure focused on the mutual effects of two switching operation. Especially low side gate-source voltage is analyzed mathematically according to the high side switch turn-on and turn-off operation. Moreover, the influence of each gate resistance and parasitic component on the switching characteristic of other side switch is investigated, and the formula, simulation and experimental results are compared with theoretical data.
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