The Study of 193 nm Photoresist

This paper discuss the preparation technology of 193 nm photoresist from the structure design of matrix polymer,the synthetic technology of monomer and of matrix polymer, the evaluation of photo-acid generator and prescription research. Various suitable monomers and various structural matrix polymers were synthesized, a plenty of formulation research was carried out and the best formulation was sieved. The photoresist sample prepared was evaluated by SEMATECH. Its best resolution is 0.1 μm, the minimun exposure dose is 26 mJ/cm2;it has not only excellent resolution and photosensitivity,but also good adhesiveness and anti-dry etching.