Low temperature direct wafer to wafer bonding for 3D integration: Direct bonding, surface preparation, wafer-to-wafer alignment
作者
G. Gaudin,G. Riou,Didier Landru,Catherine Tempesta,Ionut Radu,Mariam Sadaka,Kevin Winstel,Emily Kinser,R. Hannon
标识
DOI:10.1109/3dic.2010.5751472
摘要
In this paper the integration challenges related to oxide-oxide bonding for wafer-to-wafer stacking technology are discussed. Furthermore, interface defectivity, wafer-to-wafer alignment and bond strength data are presented.