扫描仪
覆盖
计算机科学
体积热力学
薄脆饼
节点(物理)
极紫外光刻
德拉姆
多重图案
足迹
平版印刷术
计算机硬件
嵌入式系统
材料科学
纳米技术
操作系统
工程类
光电子学
人工智能
物理
生物
结构工程
古生物学
量子力学
抵抗
图层(电子)
作者
Christophe Smeets,Nico Benders,Frank Bornebroek,Joe Carbone,Roderik van Es,Arthur Minnaert,Guido Salmaso,Stuart Young
摘要
ASML NXE (0.33 NA) scanners are now commonly used for High Volume Manufacturing (HVM) of 7nm and 5 nm logic devices as well as 1z memory node devices. In 2021, ASML has introduced the NXE:3600D scanner to the market, targeting 3nm logic and 1a and 1b memory nodes. This system has entered the HVM phase and is shipping in volume. In this paper we will share the latest performance, with excellent imaging, overlay and productivity results. For the latter we will show record performance of 185 Wafers per Hour at dose 30mJ/cm2 and over 3000 Wafers per Day at customer. Furthermore, we will address the ASML roadmap and introduce the NXE:3800E scanner. The NXE:3800E will first ship in the fourth quarter of 2023, targeting the 2 nm logic node. Lastly, ASML will show its carbon footprint and energy reduction roadmap.
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