Modular Direct Laser Writing setup for high precision nanostructuring

Abstract The increasing demand for micro- and nanofabrication and in parallel the increasing requirements on feature size and resolution is leading to an enormous growth in the field of multi-photon three-dimensional fabrication. To enable new and diverse investigations in this field and to enable high precision for nanofabrication on large areas, a high precision positioning system is combined with an ultra-short pulse laser system. The aim is a modular setup with constant adherence to the Abbe-comparator principle in order to achieve systematic improvements in the area of Direct Laser Writing. For a high-quality identification of the microstructures a measurement tool based on atomic force microscopy is used. To enable the fabrication of continuous micro- and nanostructures on large area, an extremely high positioning precision is used, where no further stitching methods are necessary. Therefore as base of the Direct Laser Writing system the nanopositioning and nanomeasuring machine (NMM-1) is used, which was developed at Technische Universität Ilmenau together with SIOS Meßtechnik GmbH, with a positioning volume of 25 mm × 25 mm × 5 mm and a positioning resolution in the sub-nanometer range. First investigations already confirmed that microfabrication with a Femtosecond Laser and the NMM-1 could be realized and showed the possibility of further developments in the field of Direct Laser Writing. Now the modular structure as a research platform is designed in such a way that the various extensions and measurement setups for large-scale investigations can always be implemented in a metrologically traceable manner. The presented work shows the development of a modular functional setup of an exposure system and NMM-1, which enables micro- and nanofabrication and an improvement in the structure size over large areas.