Nonprobe radio-frequency plasma diagnostics method based on the power balance in an asymmetric capacitively coupled discharge

An analytical semiquantitative theoretical model founded on the self-bias voltage dependence on the absorbed radio-frequency (rf) power of a strongly asymmetric capacitively coupled rf discharge has been developed. The model is applicable under gas-discharge conditions typical of technological etching devices and suggests an experimental method for determining basic plasma parameters, more specifically the ion flux onto the powered electrode, without using any additional probes.