Inactivation and change of tetracycline-resistant Escherichia coli in secondary effluent by visible light-driven photocatalytic process using Ag/AgBr/g-C3N4

Control of antibiotic-resistant bacteria (ARB) and their related genes in secondary effluents has become a serious issue because of increased awareness of their health risks. A considerable number of techniques have been developed in recent years, particularly in relation to advanced oxidation. However, limited information is known about cellular behavior and resistance characteristic change during photocatalytic treatment. In this study, the inactivation of tetracycline (TC)-resistant Escherichia coli (TC-E. coli), removal of TC-resistant genes (TC-RGs), and antibiotic susceptibility were evaluated by employing photocatalytic treatment using Ag/AgBr/g-C3N4 with visible light irradiation. The effects of light intensity, photocatalyst dosage, and reaction ambient temperature on photocatalysis were modelled and investigated. The rate of TC-E. coli removal was also optimized. Results demonstrated that the optimal conditions for TC-E. coli removal included light intensity of 96.0 mW/cm2, photocatalyst dosage of 211.0 mg/L, and reaction ambient temperature of 23.7 °C. Under such conditions, the ARB removal rate was 6.1 log after 90 min and the related TC-RG removal rates were 49%, 86%, 69%, and 86% for tetA, tetM, tetQ, and intl1, respectively. The minimum inhibitory concentration test after photocatalysis shows that the antibiotic resistance of TC-E. coli was enhanced, which may be mainly due to the changes in the membrane potential and resulted in difficulty in destroying the bacteria through antibiotic contact. Hence, photocatalytic treatment could be an ideal method for ARB and antibiotic-resistant gene (ARG) control in wastewater, but the health risks of the remaining ARB and ARG should be investigated further.