光电子学
材料科学
光开关
串扰
砷化镓
电子线路
蚀刻(微加工)
光学
物理
电气工程
纳米技术
工程类
图层(电子)
作者
A. Ajisawa,M. Fujiwara,J. Shimizu,M. Sugimoto,M. Uchida,Y. Ohta
出处
期刊:Electronics Letters
[Institution of Engineering and Technology]
日期:1987-10-08
卷期号:23 (21): 1121-1122
被引量:19
摘要
A 2 × 2 optical matrix switch, monolithically integrating multiple-quantum-well-gate and optical circuits fabricated by the reactive-ion-beam etching method, is described. The switch size is small, 3 mm × 1.2 mm. Low crosstalk of 20 dB at 12 V is achieved.
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